Fabrication of Microcone Array for Antireflection Structured Surface Using Metal Dotted Pattern

TLDR

The antireflection surface was produced by reactive ion etching of fused silica with fluorocarbon plasma, using a chromium microdisk array fabricated by electron‑beam lithography and lift‑off as an etching mask that shrinks under the induced electric field to form a microcone array. The resulting microcone array, with a 250‑nm period and 750‑nm height, achieves less than 0.5 % reflectivity across 400–800 nm at normal incidence.

Abstract

An antireflection surface with sub-wavelength structure has been successfully fabricated on a fused silica substrate. The fabricated antireflection structured surface consists of a microcone array of fused silica with a period shorter than the wavelengths of visible light. The microcone array is made by a reactive ion etching method using fluorocarbon plasma. A microdisk array of chromium thin film, formed by an electron-beam lithography and lift-off process, is used as the etching mask. Since an electric field induced near the substrate was focused on the edges of the metal disks, these disks gradually shrank. Consequently, a conical shape was formed. The fabricated cone array has a period of 250 nm and a height of 750 nm. Measured reflectivity of the antireflection structured surface is less than 0.5% in the wavelength range of 400–800 nm for normal incidence.