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Fabrication Of 0.06 /spl mu/m Poly-si Gate Using Duv Lithography With A Designed Si/sub x/O/sub y/N/sub z/ Film As An Arc And Hardmask

Wei W. Lee, Qizhi He, Hanratty, Rogers, Chatterjee, Kraft, Chapman

Symposium on VLSI Technology · 1997 · 12 citations · 1 references

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References

1

<title>SiOxNy:H, high-performance antireflective layer for current and future optical lithography</title>

Tohru Ogawa, Hiroyuki Nakano, Tetsuo Gocho et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 15 citations

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