Publication | Closed Access
Optimization of InGaN–GaN MQW Photodetector Structures for High-Responsivity Performance
57
Citations
23
References
2009
Year
Wide-bandgap SemiconductorPhotonicsElectrical EngineeringLayer ThicknessEngineeringPhysicsPhotodetectorsProper Device DesignApplied PhysicsAluminum Gallium NitrideHigh-responsivity PerformanceGan Power DeviceIngan-gan Multiple-quantum-wellOptoelectronicsCategoryiii-v SemiconductorCompound Semiconductor
InGaN-GaN multiple-quantum-well (MQW)-based photodetectors, with a detection edge at 450 nm and a high responsivity, have been fabricated and characterized. We show that the performance of MQW-based photodetectors strongly depends on a proper device design, i.e., number of QWs, and barrier and blocking layer thickness and doping level. Namely, the responsivity can be varied in the ~ 1 to ~ 100 mA/W range in similar structures and with the same number of QWs. These results support a model where the photocurrent increase is due to the improvement of collection efficiency caused by a change in transport mechanism for carriers photogenerated in the QWs. The transport mechanism depends on the location of the QWs in relation to the depletion region.
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