Publication | Closed Access
New applications of focused ion beam technique to failure analysis and process monitoring of VLSI
32
Citations
5
References
2003
Year
Unknown Venue
Cross SectionEngineeringNew ApplicationsStructural MaterialsIon ImplantationReliability EngineeringFailure AnalysisFailure Analysis TechniquesIon BeamInstrumentationMaterials ScienceElectrical EngineeringProcess MonitoringStructural Health MonitoringEngineering Failure AnalysisMicroelectronicsMicrostructureMicroscopic Selective Cross-sectioningMaterials CharacterizationElectronic Instrumentation
The applications presented are: (1) microscopic selective cross-sectioning and in situ observation of the cross section; and (2) the observation of aluminum microstructure. These applications make failure analysis techniques simpler and less time-consuming.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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