Controlled beam dry etching of InP by using Br2-N2 Gas

Technology and applications of broad-beam ion sources used in sputtering. Part II. Applications

J. M. E. Harper, J. J. Cuomo, H. R. Kaufman · Journal of Vacuum Science and Technology · 1982 · 215 citations

Natural Sciences, Materials Engineering, Materials Science +17

Technology of ion beam sources used in sputtering

H. R. Kaufman · Journal of Vacuum Science and Technology · 1978 · 140 citations

Engineering, Electrical Engineering, Physics +14

Smooth, low-bias plasma etching of InP in microwave Cl2/CH4/H2 mixtures

C. Constantine, C. Barratt, S. J. Pearton et al. · Applied Physics Letters · 1992 · 46 citations

Engineering, Electrical Engineering, Materials Science +17

Nanostructure fabrication in InP and related compounds

I. Adesida, K. Nummila, E. Andideh et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 37 citations

Engineering, Materials Engineering, Materials Science +17

Reactive ion etching of indium compounds using iodine containing plasmas

D. C. Flanders, L. D. Pressman, Gianni Pinelli · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 33 citations

Engineering, Electrical Engineering, Materials Science +17