Publication | Closed Access
Controlled beam dry etching of InP by using Br2-N2 Gas
44
Citations
14
References
1996
Year
Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabricationSurface ScienceApplied PhysicsBeam Dry EtchingMicroelectronicsPlasma EtchingOptoelectronics
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