Surface Review and Letters · 2005 · 48 citations · 13 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsOptoelectronicsThin FilmsOptical Properties Of SolidsOptoelectronic MaterialsOxide SemiconductorsThin Film Electrical PropertiesThin Film Optical PropertiesThin-film MaterialsOptical Thin Film CharacterizationPost-deposition AnnealingRapid Thermal OxidationSheet ResistanceThermal OxidationThin Oxide FilmsThin-film Optoelectronic MaterialsThin-film Oxides
Conductive transparent In 2 O 3 thin films with (222)-preferred orientation were prepared by rapid thermal oxidation (RTO) in static air of indium thin films at condition 200°C/30 s. Detailed structural, electrical, and optical characteristics of the film are presented. The data are interpreted to give a direct bandgap of 3.6 eV and indirect bandgap of 2.5 eV. The grown In 2 O 3 films exhibited high figure of merit and sheet resistance as low as 20 Ω/sq. in the absence of any post-deposition annealing conditions. The mobility of these films was estimated to be 31 cm 2 · V -1 · s -1 . These results are compared with those of In 2 O 3 films prepared by other methods.
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