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In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO<sub>2</sub> and V<sub>2</sub>O<sub>3</sub> thin films
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Citations
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References
2015
Year
Thin Film PhysicsEngineeringOxidation ResistanceSolid-state ChemistryThin Film Process TechnologyChemistryV–o SystemThin Film ProcessingMaterials ScienceInorganic ChemistryMaterials EngineeringOxide ElectronicsMagnitude Resistance SwitchingMaterial AnalysisElectronic MaterialsNatural SciencesSurface ScienceApplied PhysicsThin FilmsChemical Vapor Deposition
VO<sub>2</sub> and V<sub>2</sub>O<sub>3</sub> thin films were prepared during <italic>in situ</italic> XRD investigation by oxidation and reduction of V and V<sub>2</sub>O<sub>5</sub>. Films show up to 5 orders of magnitude resistance switching.
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