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30-nm-channel-length c-axis aligned crystalline In-Ga-Zn-O transistors with low off-state leakage current and steep subthreshold characteristics
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Citations
2
References
2015
Year
Unknown Venue
Crystalline In-ga-zn-o TransistorsWide-bandgap SemiconductorElectrical EngineeringDielectric AnisotropyEngineeringSemiconductor TechnologyPhysicsLow Off-state LeakageNanoelectronicsElectronic Engineering30-Nm-channel-length C-axisApplied PhysicsOxide ElectronicsBias Temperature InstabilityFets ExhibitMicroelectronicsCaac Crystal StructureSemiconductor Device
We report the world's smallest field effect transistors (FETs) with channel lengths of 32 nm including c-axis aligned crystalline (CAAC) In-Ga-Zn-O as their active layers, which achieve low off-state leakage currents. Furthermore, these FETs exhibit excellent subthreshold swing values despite having thick gate insulating film. The FET operation has been achieved owing to the 3D gate structure with a thin active layer, due to the FETs being accumulation-type FETs with intrinsic channels, and due to the dielectric anisotropy of the CAAC crystal structure.
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