Publication | Closed Access
Temperature dependence of Q in spiral inductors fabricated in a silicon-germanium/BiCMOS technology
29
Citations
4
References
2002
Year
Unknown Venue
Electrical EngineeringEngineeringRf SemiconductorPhysicsHigh-frequency DeviceNanoelectronicsElectronic EngineeringSpiral InductorsApplied PhysicsTemperature DependenceSilicon-germanium/bicmos TechnologyBias Temperature InstabilityPlanar InductorOn-chip Planar InductorsTemperature RangeMicroelectronicsSemiconductor Device
The behavior of on-chip planar inductors fabricated over a conductive silicon substrate has been characterized over the temperature range from -55/spl deg/C to 125/spl deg/C for the first time. Q was observed to decrease with increasing temperature over the frequency range up to and including the frequency where Q peaks. Inductance was seen to vary little across the temperature and frequency range up to one-half the self-resonant frequency. The behavior of Q with temperature was explained in the context of the temperature coefficients of its resistive parasitics. An energy-based definition for Q that takes into account the distributed nature of the planar inductor was presented and shown to give higher numbers than the conventional impedance-based definition at frequencies above one-tenth of the self-resonant frequency.
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