Positive Working Photosensitive Polyimide: The Effect of Some Properties on Sensitivity

Abstract

The polymers were prepared from diamines and diacid chlorides which were derived from the reaction product of tetra carboxylic dianhydride and o-nitrobenzyl a cohol having various ubstituent groups. The photoreaction f the poly-mers was confirmed from the change in IR spectra of the film caused by exposure to UV light from a Hg-Xe lamp. The x-posed areas ofthe film dissolved in basic solution, forming the positive tones. The effect of some properties on sensitivity was investigated. The polymer having a methyl group at the a-position f o-nitrobenzyl group Showed a higher sensitivity than the other. There was a marked ifference in the sensitivity between the polymers having different molecular weights, and their sensitivities decrease as their molecular weights increase. The sensitivity of the polymer was influenced by the concentration f a developer. In microelectronics industry, there has been growing in-terest in developing the technology employing an organic polymer as an insulator for multilevel interconnections. The demands on these polymers include xcellent thermal stabilities, electrical and mechanical properties, etc. Polyi-mides have been widely used as an organic polymer capa-