Wavefront Measurement Accuracy

Wavefront Measurement Accuracy is the precision with which a wavefront sensing system captures the actual optical aberrations of an optical system or the human eye, distinguished from related metrics by its focus on the fidelity of spatial phase deviation measurements relative to a reference or ideal wavefront.

185

Publications

6.2K

Citations

670

Authors

206

Institutions

Publications per year

2017–2026

43

Authors

670

  1. KA
    Kenneth A. Goldberg

    Lawrence Berkeley National Laboratory, United States

    7 publications · 216 citations

    7

    h-index

  2. CR
    Changhui Rao

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

    5 publications · 86 citations

    5

    h-index

  3. DR
    Daniel R. Neal

    Wavefront Research (United States), United States

    4 publications · 242 citations

    4

    h-index

  4. PN
    Patrick Naulleau

    Lawrence Berkeley National Laboratory, United States

    4 publications · 154 citations

    4

    h-index

  5. JB
    Jeffrey Bokor

    University of California, Berkeley, United States

    4 publications · 81 citations

    4

    h-index

1–5 of 670

Venues

  1. Applied Optics

    34 publications · 1.6K citations

    21

    h-index

  2. 16

    h-index

  3. Applied Optics

    AO · 17 publications · 377 citations

    15

    h-index

  4. Optics Express

    21 publications · 704 citations

    15

    h-index

  5. Optics Letters

    9 publications · 454 citations

    9

    h-index

1–5