Void Elimination

Void Elimination is a process-level mechanism in materials science that belongs to the class of interfacial defect mitigation techniques, specifically distinguished by its role in removing micro-voids at the faying surfaces during diffusion bonding through atomic diffusion and plastic deformation under applied pressure and elevated temperature.

64

Publications

2.4K

Citations

270

Authors

95

Institutions

Publications per year

2017–2026

15

Authors

270

  1. CC
    Chih‐Ming Chen

    National Chung Hsing University, Taiwan

    2 publications · 35 citations

    2

    h-index

  2. CR
    C. R. Kao

    National Taiwan University, Taiwan

    2 publications · 75 citations

    2

    h-index

  3. YY
    Yang Yang

    University of Central Florida, United States

    2 publications · 66 citations

    2

    h-index

  4. HL
    Hao Lü

    Shanghai Jiao Tong University, China

    2 publications · 66 citations

    2

    h-index

  5. CY
    Chun Yu

    Shanghai Jiao Tong University, China

    2 publications · 66 citations

    2

    h-index

1–5 of 270

Venues

  1. Microelectronics Reliability

    5 publications · 185 citations

    5

    h-index

  2. Journal of Materials Processing Technology

    3 publications · 167 citations

    3

    h-index

  3. Polymer Composites

    3 publications · 79 citations

    3

    h-index

  4. Scripta Materialia

    3 publications · 204 citations

    3

    h-index

  5. Materials Letters

    2 publications · 56 citations

    2

    h-index

1–5