Vacuum Annealing

Vacuum Annealing is a thermal treatment process in which a thin film is heated in a vacuum environment to reduce defects and improve crystallinity by minimizing oxidation and contamination through the absence of reactive gases.

324

Publications

16K

Citations

1.5K

Authors

464

Institutions

Publications per year

2017–2026

71

Authors

1.5K

  1. YY
    Yee‐Chia Yeo

    National University of Singapore, Singapore

    5 publications · 91 citations

    5

    h-index

  2. TB
    Thomas B. Scott

    University of Bristol, United Kingdom

    4 publications · 126 citations

    4

    h-index

  3. TY
    Ting Yu

    Nanyang Technological University, Singapore

    3 publications · 614 citations

    3

    h-index

  4. VM
    V. M. Naik

    Wayne State University, United States

    3 publications · 193 citations

    3

    h-index

  5. DC
    D. Crǎciun

    National Institute for Laser Plasma and Radiation Physics, Romania

    3 publications · 63 citations

    3

    h-index

1–5 of 1.5K

Venues

  1. Applied Physics Letters

    29 publications · 1.3K citations

    21

    h-index

  2. Journal of Applied Physics

    29 publications · 1.3K citations

    21

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 16 publications · 378 citations

    12

    h-index

  4. The Journal of Physical Chemistry C

    9 publications · 768 citations

    9

    h-index

  5. Thin Solid Films

    9 publications · 306 citations

    9

    h-index

1–5