Vacuum Annealing
Vacuum Annealing is a thermal treatment process in which a thin film is heated in a vacuum environment to reduce defects and improve crystallinity by minimizing oxidation and contamination through the absence of reactive gases.
324
Publications
16K
Citations
1.5K
Authors
464
Institutions
Publications per year
2017–2026
71
Parents
324
1–5 of 324
1.5K
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National Institute for Laser Plasma and Radiation Physics, Romania
3 publications · 63 citations
3
h-index
1–5 of 1.5K
464

Centre National de la Recherche Scientifique
Paris, France
11 h-index
44 publications
973 citations
National University of Singapore
Singapore, Singapore
10 h-index
36 publications
2.7K citations

Tohoku University
Sendai, Japan
9 h-index
41 publications
1.3K citations
The University of Tokyo
Tokyo, Japan
7 h-index
22 publications
354 citations

University of Bristol
Bristol, United Kingdom
6 h-index
18 publications
815 citations
Tsinghua University
Beijing, China
6 h-index
19 publications
2.5K citations

Chinese Academy of Sciences
Beijing, China
6 h-index
22 publications
793 citations
Stanford University
Stanford, United States
5 h-index
13 publications
1K citations
1–8 of 464
29 publications · 1.3K citations
21
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29 publications · 1.3K citations
21
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JJAP · 16 publications · 378 citations
12
h-index
9 publications · 768 citations
9
h-index
9 publications · 306 citations
9
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