Throwing Power

Throwing Power is a metric within the academic context of current distribution that quantifies the ability of an electrodeposition process to uniformly distribute current density across irregularly shaped substrates, distinguishing it from related electrochemical performance indicators by its specific focus on geometric conformity in plating efficiency.

16

Publications

394

Citations

44

Authors

17

Institutions

Publications per year

2017–2026

4

Authors

44

  1. DL
    D. Landolt

    École Polytechnique Fédérale de Lausanne, Switzerland

    2 publications · 41 citations

    2

    h-index

  2. ZA
    Z. Abdel Hamid

    Central Metallurgical Research and Development Institute, Egypt

    1 publications · 26 citations

    1

    h-index

  3. MG
    Mark Goodenough

    Loughborough University, United Kingdom

    1 publications · 19 citations

    1

    h-index

  4. CW
    Chong Wang

    University of Electronic Science and Technology of China, China

    1 publications · 19 citations

    1

    h-index

  5. HF
    Hero F. David

    SRC, United States

    1 publications · 21 citations

    1

    h-index

1–5 of 44

Venues

  1. Transactions of the IMF

    4 publications · 84 citations

    4

    h-index

  2. Journal of The Electrochemical Society

    JES · 3 publications · 86 citations

    3

    h-index

  3. Electrochimica Acta

    1 publications · 33 citations

    1

    h-index

  4. Materials Chemistry and Physics

    1 publications · 26 citations

    1

    h-index

  5. Chemical Physics Letters

    1 publications · 23 citations

    1

    h-index

1–5