Surface Diffusion During Deposition is a thin-film growth phenomenon characterized by the thermally driven migration of adsorbed atoms or molecules across a substrate surface prior to irreversible attachment, distinguishing it from bulk diffusion or direct nucleation processes.
134
Publications
7.2K
Citations
444
Authors
178
Institutions
Publications per year
2017–2026
5
Parents
Publications
134
1–5 of 134
Authors
444
- PD
3
h-index
- RG
3
h-index
- JD
3
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- RWRobert Winkler
Austrian Centre for Electron Microscopy and Nanoanalysis, Austria
2 publications · 106 citations
2
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- DJ
2
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1–5 of 444
Institutions
178
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
8 h-index
12 publications
699 citations
Centre National de la Recherche Scientifique
Paris, France
6 h-index
20 publications
468 citations
IBM (United States)
Armonk, United States
5 h-index
8 publications
575 citations
University of Tennessee at Knoxville
Knoxville, United States
3 h-index
4 publications
220 citations
Arizona State University
Tempe, United States
3 h-index
8 publications
209 citations
Oak Ridge National Laboratory
Oak Ridge, United States
3 h-index
7 publications
374 citations
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas
La Plata, Argentina
2 h-index
9 publications
114 citations
Kyoto University
Kyoto, Japan
2 h-index
6 publications
87 citations
1–8 of 178
Venues
- Physical Review Letters
PRL · 10 publications · 1.2K citations
10
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- Physical review. B, Condensed matter
PRB · 10 publications · 570 citations
10
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- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
9 publications · 242 citations
9
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- Surface Science
8 publications · 424 citations
8
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- Thin Solid Films
8 publications · 356 citations
8
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1–5