Soft Etching

Soft Etching is a methodological technique within the domain of soft lithography that selectively removes material from a substrate using a patterned elastomeric stamp as a masking agent to define micro- or nano-scale features through localized chemical or physical etching.

22

Publications

3K

Citations

119

Authors

50

Institutions

Publications per year

2017–2026

6

Authors

119

  1. RG
    Ralph G. Nuzzo

    University of Illinois Urbana-Champaign, United States

    2 publications · 72 citations

    2

    h-index

  2. SN
    Satoshi Ninomiya

    University of Yamanashi, Japan

    2 publications · 27 citations

    2

    h-index

  3. GM
    George M. Whitesides

    Harvard University, United States

    2 publications · 2.3K citations

    2

    h-index

  4. KH
    Kenzo Hiraoka

    University of Yamanashi, Japan

    2 publications · 27 citations

    2

    h-index

  5. LC
    Lee Chuin Chen

    University of Yamanashi, Japan

    2 publications · 27 citations

    2

    h-index

1–5 of 119

Venues

  1. Advanced Materials

    2 publications · 77 citations

    2

    h-index

  2. physica status solidi (a)

    1 publications · 11 citations

    1

    h-index

  3. ECS Journal of Solid State Science and Technology

    JSS · 1 publications · 35 citations

    1

    h-index

  4. Journal of Surface Analysis

    1 publications · 11 citations

    1

    h-index

  5. Journal of Materials Chemistry

    1 publications · 11 citations

    1

    h-index

1–5