Shadow Mask Patterning

Shadow Mask Patterning is a thin-film patterning technique that belongs to the class of physical vapor deposition methods, distinguished by the use of a precisely fabricated opaque mask to selectively block deposited material and thereby define patterned features on a substrate without post-deposition etching.

197

Publications

7K

Citations

863

Authors

268

Institutions

Publications per year

2017–2026

28

Variants

Stencil Lithography

Publications

197

1–5 of 197

Authors

863

  1. AG
    A. G. Gnedovets

    Baikov Institute of Metallurgy and Materials Science, Russia

    3 publications · 123 citations

    3

    h-index

  2. SR
    Stephen R. Forrest

    Princeton University, United States

    3 publications · 198 citations

    3

    h-index

  3. SS
    Soeren Steudel

    IMEC, Belgium

    3 publications · 138 citations

    3

    h-index

  4. JG
    Jan Genoe

    IMEC, Belgium

    3 publications · 138 citations

    3

    h-index

  5. VV
    Vladimir V. Popik

    University of Georgia, United States

    3 publications · 409 citations

    3

    h-index

1–5 of 863

Venues

  1. Applied Physics Letters

    31 publications · 1.2K citations

    19

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 9 publications · 246 citations

    9

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 8 publications · 266 citations

    8

    h-index

  4. Sensors and Actuators A Physical

    8 publications · 355 citations

    8

    h-index

  5. 6

    h-index

1–5