Shadow Mask Patterning
Shadow Mask Patterning is a thin-film patterning technique that belongs to the class of physical vapor deposition methods, distinguished by the use of a precisely fabricated opaque mask to selectively block deposited material and thereby define patterned features on a substrate without post-deposition etching.
197
Publications
7K
Citations
863
Authors
268
Institutions
Publications per year
2017–2026
28
Variants
Stencil Lithography
Parents
197
Hye Ryung Byon, Hee Cheul Choi · Journal of the American Chemical Society · 2006 · 280 citations
Jiang He, Runhui Zhou, Yufei Zhang et al. · Advanced Functional Materials · 2021 · 136 citations
1–5 of 197
863
Baikov Institute of Metallurgy and Materials Science, Russia
3 publications · 123 citations
3
h-index
3
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3
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3
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3
h-index
1–5 of 863
268
The University of Tokyo
Tokyo, Japan
10 h-index
33 publications
785 citations
Seoul National University
Seoul, South Korea
6 h-index
19 publications
617 citations

Chinese Academy of Sciences
Beijing, China
6 h-index
37 publications
1.3K citations

University of Twente
Enschede, The Netherlands
4 h-index
15 publications
758 citations
École Polytechnique Fédérale de Lausanne
Lausanne, Switzerland
4 h-index
18 publications
565 citations
Kyung Hee University
Seoul, South Korea
4 h-index
12 publications
369 citations
University of Chinese Academy of Sciences
Beijing, China
4 h-index
24 publications
810 citations

University of Georgia
Athens, United States
4 h-index
12 publications
1.8K citations
1–8 of 268
31 publications · 1.2K citations
19
h-index
JMM · 9 publications · 246 citations
9
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JJAP · 8 publications · 266 citations
8
h-index
8 publications · 355 citations
8
h-index
6 publications · 118 citations
6
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1–5