Rotation Optimization

Rotation Optimization is a methodological framework in ion implantation that systematically determines the optimal angular orientation of a semiconductor wafer during ion beam exposure to minimize channeling effects and ensure uniform dopant distribution.

8

Publications

404

Citations

35

Authors

13

Institutions

Publications per year

2017–2026

2

Authors

35

  1. TF
    T. Furukawa

    National Institutes for Quantum Science and Technology, Japan

    1 publications · 10 citations

    1

    h-index

  2. SS
    S.B. Slimane

    KTH Royal Institute of Technology, Sweden

    1 publications · 31 citations

    1

    h-index

  3. HR
    Humberto Rocha

    University of Coimbra, Portugal

    1 publications · 34 citations

    1

    h-index

  4. BF
    B.C. Ferreira

    University of Aveiro, Portugal

    1 publications · 34 citations

    1

    h-index

  5. AP
    Andrei Pugachev

    Stanford University, United States

    1 publications · 125 citations

    1

    h-index

1–5 of 35

Venues

  1. 1

    h-index

  2. Physica Medica

    1 publications · 34 citations

    1

    h-index

  3. 1

    h-index

  4. Energy

    1 publications · 51 citations

    1

    h-index

1–5