Dopant Defects

Dopant Defects is a type of point defect in crystalline materials wherein foreign atoms introduced into the host lattice create localized deviations in atomic arrangement and electronic structure, distinct from intrinsic defects by originating from deliberate impurity doping to modify material properties.

245

Publications

12.2K

Citations

967

Authors

371

Institutions

Publications per year

2017–2026

40

Authors

967

  1. AC
    A. Chroneos

    Imperial College London, United Kingdom

    8 publications · 343 citations

    8

    h-index

  2. AU
    Akira Uedono

    University of Tsukuba, Japan

    6 publications · 115 citations

    6

    h-index

  3. ZL
    Z. Liliental‐Weber

    Lawrence Berkeley National Laboratory, United States

    6 publications · 538 citations

    6

    h-index

  4. NK
    Navaratnarajah Kuganathan

    Imperial College London, United Kingdom

    5 publications · 86 citations

    5

    h-index

  5. PE
    Ph. Ebert

    Forschungszentrum Jülich, Germany

    5 publications · 140 citations

    5

    h-index

1–5 of 967

Venues

  1. Applied Physics Letters

    24 publications · 1.4K citations

    18

    h-index

  2. Journal of Applied Physics

    21 publications · 674 citations

    16

    h-index

  3. Physical review. B, Condensed matter

    PRB · 11 publications · 1.3K citations

    10

    h-index

  4. Physical Review Letters

    PRL · 8 publications · 1.9K citations

    8

    h-index

  5. Journal of Crystal Growth

    8 publications · 166 citations

    8

    h-index

1–5