Atomic Surface Diffusion

Atomic Surface Diffusion is a type of surface diffusion process in which individual atoms migrate across the surface of a solid material through thermally activated hopping mechanisms, distinguished by its exclusive focus on the motion of single atoms rather than clusters or molecules.

401

Publications

20.3K

Citations

1.1K

Authors

420

Institutions

Publications per year

2017–2026

42

Authors

1.1K

  1. GE
    Gert Ehrlich

    University of Illinois Urbana-Champaign, United States

    17 publications · 1.9K citations

    17

    h-index

  2. TT
    Tien T. Tsong

    Pennsylvania State University, United States

    13 publications · 767 citations

    13

    h-index

  3. GL
    G. L. Kellogg

    Sandia National Laboratories, United States

    8 publications · 905 citations

    8

    h-index

  4. JL
    José Luis Vega

    Instituto de Física Fundamental, Spain

    7 publications · 140 citations

    7

    h-index

  5. SM
    S. Miret‐Artés

    Instituto de Física Fundamental, Spain

    7 publications · 140 citations

    7

    h-index

1–5 of 1.1K

Venues

  1. Physical Review Letters

    PRL · 40 publications · 5K citations

    31

    h-index

  2. The Journal of Chemical Physics

    43 publications · 2K citations

    28

    h-index

  3. Surface Science

    46 publications · 2.4K citations

    27

    h-index

  4. Physical review. B, Condensed matter

    PRB · 37 publications · 1.9K citations

    23

    h-index

  5. Journal of Applied Physics

    15 publications · 496 citations

    13

    h-index

1–5