A. Estève

Speeding up the unique assets of atomic layer deposition

David Muñoz‐Rojas, Tony Maindron, A. Estève et al. · Materials Today Chemistry · 2019 · 98 citations

Materials Science, Unique Assets, Engineering +5

On the early stage of aluminum oxidation: An extraction mechanism via oxygen cooperation

Cloé Lanthony, Jean‐Marie Ducéré, M. Djafari Rouhani et al. · The Journal of Chemical Physics · 2012 · 46 citations

Aluminium Nitride, Engineering, Oxidation Resistance +20

Diffusion of oxygen atom in the topmost layer of the Si(100) surface: Structures and oxidation kinetics

Anne Hémeryck, N. Richard, A. Estève et al. · Surface Science · 2007 · 29 citations

Surface Characterization, Oxidation Kinetics, Topmost Layer +10

Fundamental steps towards interface amorphization during silicon oxidation: Density functional theory calculations

Anne Hémeryck, A. Estève, N. Richard et al. · Physical Review B · 2009 · 19 citations

Materials Science, Semiconductors, Engineering +15

Asymmetric diffusion as a key mechanism in Ni/Al energetic multilayer processing: A first principles study

M. Petrantoni, Anne Hémeryck, Jean‐Marie Ducéré et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2010 · 17 citations · Full text

Aluminium Nitride, Engineering, Multilayer Deposition Processes +21