Statistics
Publications
4
Citations
85
H-Index
4
Active since
1978
Affiliations
Hosei University(Current)
Shigeaki Nakamura is an author at Hosei University specializing in natural sciences, silicon wafer processing, and surface engineering.
Publications per year
1978–2004
4
4
Silicidation Reaction and Stress in Ti/Si
Shih-Chang Chen, Hiroyuki Tamura, Tohru Hara et al. · Japanese Journal of Applied Physics · 1992 · 10 citations
Natural Sciences, Materials Engineering, Materials Science +13
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