Hiroshi Ohkura

Growth processes of particles in high frequency silane plasmas

Yukio Watanabe, Masaharu Shiratani, Hiroharu Kawasaki et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 74 citations

Natural Sciences, Chemical Engineering, Physics +16

Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films

Yukio Watanabe, Masaharu Shiratani, Tsuyoshi Fukuzawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 51 citations

Natural Sciences, Materials Science, Physics +15

Roles of SiH₃and SiH₂Radicals in Particle Growth in rf Silane Plasmas

Hiroharu Kawasaki, Hiroshi Ohkura, Tsuyoshi Fukuzawa et al. · Japanese Journal of Applied Physics · 1997 · 41 citations

Natural Sciences, Materials Science, Physics +15

Vibronic Theory of the Stark Effects on the Relaxed Excited State of the F Center

Koichi Imanaka, Takeshi Iida, Hiroshi Ohkura · Journal of the Physical Society of Japan · 1977 · 39 citations

Natural Sciences, Physics, Physical Chemistry +13

The Resonant Secondary Emission of the <i>F</i> Center in KCl at 80 K

Yuzo Mori, Ryo Hattori, Hiroshi Ohkura · Journal of the Physical Society of Japan · 1982 · 34 citations

Natural Sciences, Physics, Condensed Matter Physics +15