Concepedia

C-K. Hu

CH

Statistics

Publications

2

Citations

83

H-Index

2

Active since

1992

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

C-K. Hu is an author at IBM Research - Thomas J. Watson Research Center specializing in interface science, metallic materials, and electromigration.

Publications per year

1992–1993

2

Publications

2

Electromigration failure due to interfacial diffusion in fine Al alloy lines

C-K. Hu, M. B. Small, Kenneth P. Rodbell et al. · Applied Physics Letters · 1993 · 42 citations

, , +16

Electromigration in two-level interconnect structures with Al alloy lines and W studs

C-K. Hu, P. S. Ho, M. B. Small · Journal of Applied Physics · 1992 · 41 citations

, , +16

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