Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects

Mizuhisa Nihei, Akio Kawabata, Daiyu Kondo, +3

Japanese Journal of Applied Physics

Carbon Nanotube BundlesEngineeringCarbon NanotechnologyCarbon-based MaterialNanoelectronics +15

Simultaneous Formation of Multiwall Carbon Nanotubes and their End-Bonded Ohmic Contacts to Ti Electrodes for Future ULSI Interconnects

Mizuhisa Nihei, Masahiro Horibe, Akio Kawabata, +1

Japanese Journal of Applied Physics

NanosheetEngineeringNickel Catalyst ElectrodesElectrode-electrolyte InterfaceSimultaneous Formation +19

Carbon Nanotubes for VLSI: Interconnect and Transistor Applications

Yuji Awano, Shintaro Sato, Mizuhisa Nihei, +3

Proceedings of the IEEE

NanosheetEngineeringCarbon NanotechnologyCnt Growth TechnologiesNanocomputing +14

Low temperature grown carbon nanotube interconnects using inner shells by chemical mechanical polishing

Daisuke Yokoyama, Takayuki Iwasaki, Tsuyoshi Yoshida, +5

Applied Physics Letters

NanosheetEngineeringCarbon NanotechnologyMechanical EngineeringLarge Scale Integration +24

Low-Temperature Synthesis of Graphene and Fabrication of Top-Gated Field Effect Transistors without Using Transfer Processes

Daiyu Kondo, Shintaro Sato, Katsunori Yagi, +4

Applied Physics Express

Materials ScienceThickness-controlled GrowthElectrical EngineeringElectronic DevicesMulti-layer Graphene +13

Growth of diameter-controlled carbon nanotubes using monodisperse nickel nanoparticles obtained with a differential mobility analyzer

Shintaro Sato, Akio Kawabata, Mizuhisa Nihei, +1

Chemical Physics Letters

Materials ScienceEngineeringCarbon-based MaterialMonodisperse Nickel NanoparticlesNanomaterials +7

Low-resistance multi-walled carbon nanotube vias with parallel channel conduction of inner shells

Mizuhisa Nihei, Daiyu Kondo, Akio Kawabata, +6

Materials ScienceParallel Channel ConductionElectrical EngineeringEngineeringCarbon-based Material +6

Electrical Properties of Carbon Nanotubes Grown at a Low Temperature for Use as Interconnects

Daisuke Yokoyama, Takayuki Iwasaki, Kentaro Ishimaru, +5

Japanese Journal of Applied Physics

EngineeringElectrical PropertiesInterconnect (Integrated Circuits)Low TemperatureGraphene Nanomeshes +21

Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes

Masahiro Horibe, Mizuhisa Nihei, Daiyu Kondo, +2

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringCarbon-based Material +13

Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer

Mizuhisa Nihei, Akio Kawabata, Yuji Awano

Japanese Journal of Applied Physics

Materials ScienceChemical EngineeringNickel Film CatalystEngineeringDirect Diameter-controlled Growth +10