K. Fujihara

Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition

M.-H. Cho, Youngchae Roh, C. N. Whang et al. · Applied Physics Letters · 2002 · 338 citations

Engineering, Materials Engineering, Materials Science +17

Dielectric characteristics of Al2O3–HfO2 nanolaminates on Si(100)

M.-H. Cho, Youngchae Roh, C. N. Whang et al. · Applied Physics Letters · 2002 · 132 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effect of polysilicon gate on the flatband voltage shift and mobility degradation for ALD-Al/sub 2/O/sub 3/ gate dielectric

J.H. Lee, K. Koh, N.I. Lee et al. · 2002 · 38 citations

Engineering, Electrical Engineering, Materials Science +17

Directly Converting CO₂ to Light Hydrocarbons on a FeCoAl Prussian Blue Analogue-Based Core–Shell Catalyst via Fischer–Tropsch Synthesis

Yanbing Li, Yingluo He, K. Fujihara et al. · ACS Catalysis · 2023 · 26 citations

Natural Sciences, Chemical Engineering, Chemistry +17

CMOS device scaling beyond 100 nm

Seokil Song, Jiali Yi, W.S. Kim et al. · 2002 · 23 citations

Engineering, Electrical Engineering, Electronic Materials +16