Richard D. Pilkington

Author

University of Salford

Also Known As

Pilkington, Richard D, Richard D Pilkington, Richard D. Pilkington, Richard Pilkington, Tony Paterson

Publications

186

Citations

H-Index

Concepts

All Affiliations

University of Salford

About

Richard D. Pilkington is an author at University of Salford specializing in engineering, surface science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	126
2	Applied Physics	4	4	96
3	Chemistry	2	2	50
4	Business	1	1	18
5	Social Sciences	1	1	18

Richard D. Pilkington

Publications

144

Citations

H-Index

Page 1

	Year	Citations
The plasma enhanced chemical vapour deposition of CuInSe2 Philip A. Jones, A.D. Jackson, Paul D. Lickiss, Thin Solid Films EngineeringSurface ScienceApplied PhysicsVacuum DeviceChemistry	1994	35
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target Sreejith Karthikeyan, Arthur E. Hill, Richard D. Pilkington Thin Solid Films Materials ScienceMaterials EngineeringEngineeringOxide ElectronicsSurface Science	2013	25
Low temperature pulsed direct current magnetron sputtering technique for single phase β-In2S3 buffer layers for solar cell applications Sreejith Karthikeyan, Arthur E. Hill, Richard D. Pilkington Applied Surface Science Solar Cell ApplicationsElectrical EngineeringEngineeringApplied PhysicsThin Film Process Technology	2017	19
In the national interest? Canada and the East Pakistan crisis of 1971 Richard D. Pilkington Journal of Genocide Research EconomicsPublic PolicyDiplomacyEast PakistanInternational Relations	2011	18
Single step deposition method for nearly stoichiometric CuInSe2 thin films Sreejith Karthikeyan, Arthur E. Hill, Richard D. Pilkington, Thin Solid Films Materials ScienceMaterial AnalysisEngineeringSurface ScienceApplied Physics	2010	17
The chemical vapour deposition of indium and copper/indium alloys from metal hexafluoracetylacetonate complexes Philip A. Jones, A.D. Jackson, Richard D. Pilkington, Thin Solid Films Materials EngineeringInorganic ChemistryMaterials ScienceMetal Hexafluoracetylacetonate ComplexesEngineering	1993	15
The influence of operating parameters on pulsed D.C. magnetron sputtering plasma Sreejith Karthikeyan, Arthur E. Hill, John Cowpe, Vacuum Electrical EngineeringEngineeringPlasma ScienceOperating ParametersPlasma Physics	2010	15

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