Sang-Gyun Woo

Trade-off between inverse lithography mask complexity and lithographic performance

Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Ji-Young Lee, Jangho Shin, Hyunwoo Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 43 citations

Engineering, Electrical Engineering, Materials Science +17

Mask writing time explosion and its effect on CD control in e-beam lithography

Sang Hee Lee, Jin Choi, Seong Jun Min et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Electrical Engineering, Electronic Materials +10

Simulation and fabrication of attenuated phase-shifting masks: CrF_x

Eunah Kim, Seungbum Hong, Kyong-Sub Kim et al. · Applied Optics · 1997 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +17

A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources

Seungbum Hong, Eunah Kim, Byeong‐Soo Bae et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +13