George J. Slusser - Concepedia

Author

George J. Slusser

IBM (United States)

Also Known As

G. J. Slusser, G. Slusser, G.J. Slusser, George J. Slusser

Publications

296

Citations

H-Index

Concepts

All Affiliations

IBM (United States)Purdue University West Lafayette

About

George J. Slusser is an author at IBM (United States) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	11	278
2	Applied Physics	8	8	206
3	Chemistry	2	2	58
4	Natural Sciences	1	1	39
5	Chemical Engineering	1	1	19

George J. Slusser

Publications

278

Citations

H-Index

Page 1

	Year	Citations
Formation of Silicon‐on‐Insulator Structures by Implanted Nitrogen L. Nesbit, S. R. Stiffler, George J. Slusser, Journal of The Electrochemical Society Materials ScienceSemiconductor TechnologyImplant TemperatureBuried SiliconFinal Microstructure	1985	43
Dopant diffusion in tungsten silicide Paihung Pan, Ning Hsieh, H.J. Geipel, Journal of Applied Physics Materials ScienceSemiconductorsEngineeringDiffusion ResistanceCrystalline Defects	1982	39
The preparation and characterization of titanium boride films James G. Ryan, S. Roberts, George J. Slusser Thin Solid Films Materials EngineeringMaterials ScienceEngineeringTitanium Boride FilmsThin Films	1987	34
The effects of alloying on stress induced void formation in aluminum-based metallizations James G. Ryan, Jeffrey Riendeau, Susan E. Shore, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringMechanical EngineeringThin Film Process TechnologyChemical DepositionElectron Microscopy	1990	32
Surface segregation of PdAg alloys induced by ion bombardment George J. Slusser, Nicholas Winograd Surface Science Materials ScienceMaterials EngineeringEngineeringSurface ScienceApplied Physics	1979	26
Microstructure of Silicon Implanted with High Doses of Nitrogen and Oxygen L. Nesbit, George J. Slusser, Robert O. Frenette, Journal of The Electrochemical Society Materials ScienceSemiconductor TechnologyIon ImplantationBuried SiliconEngineering	1986	20
Sources of surface contamination affecting electrical characteristics of semiconductors George J. Slusser, Louis G. MacDowell Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringLeakage ConcernsSurface CleanlinessChemical DepositionSemiconductor Device	1987	19
Contact metallurgy development for VLSI logic R. M. Geffken, James G. Ryan, George J. Slusser IBM Journal of Research and Development EngineeringVlsi DesignElectronic DesignSilicon On InsulatorInterconnect (Integrated Circuits)	1987	19
SIMS/XPS study of CO chemisorption on polycrystalline Pd, Ag and a PdAg alloy George J. Slusser, Nicholas Winograd Surface Science Materials ScienceCo ChemisorptionMaterials EngineeringEngineeringSims/xps Study	1980	19
Detection of high mass cluster ions sputtered from Bi surfaces A. T. Shepard, R. W. Hewitt, George J. Slusser, Chemical Physics Letters Cluster ScienceEngineeringPhysicsMicroscopySurface Science	1976	15

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