11
Publications
278
Citations
11
H-Index
1976
Active since
Affiliations
George J. Slusser is an author at IBM (United States) specializing in engineering, materials science, and applied physics.
Top concepts
EngineeringMaterial ScienceApplied PhysicsSurface ScienceMicrostructureCrystalline DefectsThin FilmsMaterials EngineeringMicroelectronicsElectronic Packaging
Publications per year
1976–1990
11
11
Dopant diffusion in tungsten silicide
Paihung Pan, Ning Hsieh, H.J. Geipel et al. · Journal of Applied Physics · 1982 · 39 citations
The effects of alloying on stress induced void formation in aluminum-based metallizations
James G. Ryan, Jeffrey Riendeau, Susan E. Shore et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 32 citations
Engineering, Mechanical Engineering, Thin Film Process Technology +20
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