M.J. Thwaites - Concepedia

Author

M.J. Thwaites

Plasma Quest (United Kingdom)

Also Known As

Dutson, J., M J Thwaites, M. J. Thwaites, M. Thwaites, M.J. Thwaites, Mike J. Thwaites, Mike Thwaites, Thwaites, M.

Publications

848

Citations

H-Index

Concepts

All Affiliations

Plasma Quest (United Kingdom)University of Salford University of Cambridge University of York Loughborough University

About

M.J. Thwaites is an author at Plasma Quest (United Kingdom) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	18	709
2	Applied Physics	12	16	573
3	Natural Sciences	3	3	83
4	Chemical Engineering	3	3	146
5	Chemistry	3	3	33

M.J. Thwaites

Publications

810

Citations

H-Index

Page 1

	Year	Citations
Transparent, flexible and solid-state supercapacitors based on room temperature ionic liquid gel Di Wei, Steve Wakeham, Tin Wing Ng, Electrochemistry Communications Materials ScienceSolid-state IonicSupercapacitorsChemical EngineeringEngineering	2009	87
Deposition of polycrystalline thin films with controlled grain size M. Vopsaroiu, G. Vallejo Fernandez, M.J. Thwaites, Journal of Physics D Applied Physics	2005	73
High-k (k=30) amorphous hafnium oxide films from high rate room temperature deposition Flora M. Li, Bernhard C. Bayer, Stephan Hofmann, Applied Physics Letters Materials EngineeringMaterials ScienceAmorphous HafniumEngineeringElectronic Materials	2011	69
Low temperature (<100°C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy Flora M. Li, Rob Waddingham, W. I. Milne, Thin Solid Films Materials ScienceMaterial AnalysisEngineeringOxide ElectronicsSurface Science	2011	64
Preparation of high moment CoFe films with controlled grain size and coercivity M. Vopsaroiu, M. Georgieva, P.J. Grundy, Journal of Applied Physics Magnetic PropertiesEngineeringMean Grain SizeMagnetoelastic MaterialsMagnetic Materials	2005	61
Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process Andrew J. Flewitt, J.D. Dutson, Paul Beecher, Semiconductor Science and Technology EngineeringZinc OxideThin Film Process TechnologySemiconductor DeviceElectronic Devices	2009	60
The observation of a direct energy band gap for CuInTe2 single crystals using electroreflectance techniques M.J. Thwaites, R. D. Tomlinson, M.J. Hampshire Solid State Communications Materials ScienceTransition Metal ChalcogenidesEngineeringPhysicsElectroreflectance Techniques	1977	50
Novel Sputtering Technology for Grain-Size Control M. Vopsaroiu, M.J. Thwaites, Scott D. Rand, IEEE Transactions on Magnetics EngineeringTarget FabricationMechanical EngineeringConventional Plasma MagnetronAdvanced Manufacturing	2004	50
Reactive plasma deposition of high quality single phase CuO thin films suitable for metal oxide solar cells Zhenzhen Li, Kemeng Tong, Ruifang Shi, Journal of Alloys and Compounds Materials ScienceChemical EngineeringCopper Oxide MaterialsEngineeringOxide Electronics	2016	49
Low temperature remote plasma sputtering of indium tin oxide for flexible display applications Steve Wakeham, M.J. Thwaites, B. Holton, Thin Solid Films Materials EngineeringMaterials ScienceEngineeringFlexible ElectronicsApplied Physics	2009	48

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