Low temperature (<100°C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy - Concepedia

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Low temperature (<100°C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy

64

Citations

20

References

2011

Year

Flora M. Li, Rob Waddingham, W. I. Milne, Andrew J. Flewitt, S.P. Speakman, James Dutson, Steve Wakeham, M.J. Thwaites

Thin Solid Films

Materials ScienceMaterial AnalysisEngineeringOxide ElectronicsSurface ScienceApplied PhysicsDeposition EnergyThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film ProcessingLow Temperature

References

	Year	Citations

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