Concepedia

Shigeru Nomura

SN

Statistics

Publications

12

Citations

325

H-Index

11

Active since

1997

Affiliations

Muroran Institute of Technology(Current)

Shigeru Nomura is an author at Muroran Institute of Technology specializing in engineering, applied physics, and thin films.

Top concepts

EngineeringApplied PhysicsThin FilmsMaterial ScienceChemistrySurface ScienceNanotechnologyChemical EngineeringSensorsGas Detection

Publications per year

1997–2003

12

Publications

12

Ge nanocrystals in SiO2 films

Takamitsu Kobayashi, Toshiaki Endoh, Hisashi Fukuda et al. · Applied Physics Letters · 1997 · 58 citations

Materials Science, Semiconductors, Sio 2 +15

Effects of additive elements on improvement of the dielectric properties of Ta2O5 films formed by metalorganic decomposition

K. M. A. Salam, Hisashi Fukuda, Shigeru Nomura · Journal of Applied Physics · 2003 · 52 citations

Dielectrics, Engineering, Thin Film Process Technology +19

Structural and Electrical Properties of Crystalline TiO<sub>2</sub> Thin Films Formed by Metalorganic Decomposition

Hisashi Fukuda, Seigo Namioka, Miho Miura et al. · Japanese Journal of Applied Physics · 1999 · 51 citations

Engineering, Solid-state Chemistry, Tio 2 +16

Structural and Electrical Properties of Crystalline CeO<sub>2</sub> Films Formed by Metalorganic Decomposition

Hisashi Fukuda, Miho Miura, Shigeyuki Sakuma et al. · Japanese Journal of Applied Physics · 1998 · 35 citations

Materials Science, Ceo 2, Material Analysis +15

Growth and characterization of Ge nanocrystals in ultrathin SiO2 films

Hisashi Fukuda, Takamitsu Kobayashi, Toshiaki Endoh et al. · Applied Surface Science · 1998 · 32 citations

Materials Science, Engineering, Nanomaterials +8

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