Steve W. Robey

Statistics

Publications

Citations

162

H-Index

Active since

1987

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

National Institute of Standards and Technology

Steve W. Robey is an author at IBM Research - Thomas J. Watson Research Center specializing in natural sciences, surface science, and materials science.

Publications per year

1987–2008

Publications

Surface processes in CF4/O2 reactive etching of silicon

G. S. Oehrlein, Steve W. Robey, J. L. Lindström · Applied Physics Letters · 1988 · 59 citations

Natural Sciences, Materials Engineering, Materials Science +17

Flux-Selected Titanyl Phthalocyanine Monolayer Architecture on Ag (111)

Yinying Wei, Steve W. Robey, Janice Reutt‐Robey · The Journal of Physical Chemistry C · 2008 · 44 citations

Natural Sciences, Chemistry, Materials Science +15

X-ray photoemission spectroscopy characterization of silicon surfaces after CF4/H2 magnetron ion etching: Comparisons to reactive ion etching

G. S. Oehrlein, A. A. Bright, Steve W. Robey · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +15

Mechanism of the Slow-Down of the Silicon Etch Rate by a Fluorocarbon Overlayer in CF<sub>4</sub>/H<sub>2</sub> Reactive Ion Etching of Silicon

G. S. Oehrlein, Steve W. Robey, M. Jaso · MRS Proceedings · 1987 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +13

Photoelectron imaging of Fermi surfaces

Richard L. Kurtz, Steve W. Robey, Lawrence T. Hudson et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 1992 · 13 citations

Natural Sciences, Materials Science, Physics +14

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