Masaru Hori

Pseudo‐Wet Plasma Mechanism Enabling High‐Throughput Dry Etching of SiO ₂ by Cryogenic‐Assisted Surface Reactions

Shih‐Nan Hsiao, Makoto Sekine, Nikolay Britun et al. · Small Methods · 2024 · 33 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

<i>In Situ</i> Monitoring Surface Reactions in Cryogenic Atomic Layer Etching of Silicon Nitride by Alternating Surface Modification with Hydrogen Fluoride Dose and Ar Plasmas

Shih‐Nan Hsiao, Makoto Sekine, Yuki Iijima et al. · Chemistry of Materials · 2024 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +17

Nonhalogen Dry Etching of Metal Carbide TiAlC by Low-Pressure N₂/H₂ Plasma at Room Temperature

Thi‐Thuy‐Nga Nguyen, Kazunori Shinoda, Shih‐Nan Hsiao et al. · ACS Applied Materials & Interfaces · 2024 · 12 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Revolutionizing reactive ion etching: ion-enhanced surface autocatalytic reactions enabling ultra-high throughput using cryogenic hydrogen-fluoride plasma

Shih‐Nan Hsiao, Yusuke Imai, Makoto Sekine et al. · Chemical Engineering Journal · 2025 · 11 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17