Cheol Hyun An

Structure and Electrical Properties of Al-Doped HfO₂ and ZrO₂ Films Grown via Atomic Layer Deposition on Mo Electrodes

Yeon Woo Yoo, Woojin Jeon, Woongkyu Lee et al. · ACS Applied Materials & Interfaces · 2014 · 90 citations

Time-Dependent Negative Capacitance Effects in Al₂O₃/BaTiO₃ Bilayers

Yu Jin Kim, Hiroyuki Yamada, Taehwan Moon et al. · Nano Letters · 2016 · 85 citations

Engineering, Ferroelectric Application, Nanoelectronics +16

Improved Initial Growth Behavior of SrO and SrTiO₃ Films Grown by Atomic Layer Deposition Using {Sr(demamp)(tmhd)}₂ as Sr-Precursor

Woongkyu Lee, Woojin Jeon, Cheol Hyun An et al. · Chemistry of Materials · 2015 · 50 citations

Engineering, Thin Film Process Technology, Chemistry +16

Controlling the Electrical Characteristics of ZrO₂/Al₂O₃/ZrO₂ Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition

Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim et al. · physica status solidi (RRL) - Rapid Research Letters · 2018 · 43 citations

Materials Science, Electrical Characteristics, Electrical Engineering +13

Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO₂ Film

Woojin Jeon, Sijung Yoo, Hyo Kyeom Kim et al. · ACS Applied Materials & Interfaces · 2014 · 41 citations

Materials Engineering, Materials Science, Material Analysis +14