Lauri Niinist�

Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials

Lauri Niinist�, Minna Nieminen, J. P�iv�saari et al. · physica status solidi (a) · 2004 · 339 citations

Natural Sciences, Materials Engineering, Materials Science +17

Studies of Thermally-Carbonized Porous Silicon Surfaces

Jarno Salonen, V P Lehto, M. Bj�rkqvist et al. · physica status solidi (a) · 2000 · 88 citations

Natural Sciences, Materials Engineering, Materials Science +17

Composition and thickness determination of thin oxide films: comparison of different programs and methods

Väino Sammelselg, Jaan Aarik, A. Aidla et al. · Journal of Analytical Atomic Spectrometry · 1999 · 42 citations

Natural Sciences, Materials Engineering, Materials Science +14

Determination of P/Al ratio in phosphorus-doped aluminium oxide thin films by XRF, RBS and FTIR

Minna Nieminen, Lauri Niinist�, Reijo Lappalainen · Microchimica Acta · 1995 · 38 citations

Natural Sciences, Materials Engineering, Materials Science +11

Atomic Force Microscopy Studies of SnO 2 Thin Film Microstruc tures Deposited by Atomic Layer Epitaxy

Mikko Utriainen, Hanna Lattu, H. Viirola et al. · Microchimica Acta · 2000 · 29 citations

Natural Sciences, Materials Science, Physics +17