K. B. Chung

Thickness dependence on crystalline structure and interfacial reactions in HfO2 films on InP (001) grown by atomic layer deposition

Yu Kang, Chang Sik Kim, M. H. Cho et al. · Applied Physics Letters · 2010 · 44 citations

Materials Science, Hfo2 Films, Crystal Structure +14

Facile fabrication of high-performance InGaZnO thin film transistor using hydrogen ion irradiation at room temperature

Byung Du Ahn, Jin‐Seong Park, K. B. Chung · Applied Physics Letters · 2014 · 42 citations

Materials Science, Room Temperature, Electrical Engineering +14

Thermal evolution and electrical correlation of defect states in Hf-based high-κ dielectrics on n-type Ge (100): Local atomic bonding symmetry

K. B. Chung, J.P. Long, Hyungtak Seo et al. · Journal of Applied Physics · 2009 · 39 citations

Engineering, Electrical Correlation, Defect States +18

Change in band alignment of HfO2 films with annealing treatments

C. J. Yim, D.-H. Ko, Moon Hyung Jang et al. · Applied Physics Letters · 2008 · 29 citations

Engineering, Band Gap, Hfo2 Films +16

Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate

Chang Sik Kim, Sang Wan Cho, M.-H. Cho et al. · Applied Physics Letters · 2008 · 23 citations

Engineering, Semiconductors, Hfo2 Films +16