Y. Akasaka - Concepedia

Author

Y. Akasaka

Mitsubishi Electric (Japan)

Also Known As

Y Akasaka, Y. AKASAKA, Y. Akasaka, Yasukazu Akasaka, Yukihiro AKASAKA

Publications

1.2K

Citations

H-Index

Concepts

All Affiliations

Mitsubishi Electric (Japan)The University of Osaka Mitsubishi Electric (Germany)Mitsubishi Corporation (United States)The University of Tokyo

About

Y. Akasaka is an author at Mitsubishi Electric (Japan) specializing in engineering, applied physics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	18	24	869
2	Applied Physics	14	15	438
3	Natural Sciences	2	2	65
4	Chemistry	2	2	34
5	Chemical Engineering	1	1	10

Y. Akasaka

Publications

938

Citations

H-Index

Page 1

	Year	Citations
An 80-MHz 8-bit CMOS D/A converter T. Miki, Yohei Nakamura, M. Nakaya, IEEE Journal of Solid-State Circuits Low-power ElectronicsElectrical EngineeringChip SizeEngineeringVlsi Design	1986	240
An 8-bit high-speed CMOS A/D converter Takuya Kumamoto, M. Nakaya, Hiroki Honda, IEEE Journal of Solid-State Circuits Electrical EngineeringEngineeringVlsi DesignData ConverterMixed-signal Integrated Circuit	1986	52
Local‐Oxidation‐Induced Stress Measured by Raman Microprobe Spectroscopy K. Kobayashi, Y. Inoue, T. Nishimura, Journal of The Electrochemical Society Materials ScienceSpectroscopySurface-enhanced Raman ScatteringRaman Microprobe SpectroscopySpectroscopic Method	1990	52
Three dimensional IC for high performance image signal processor T. Nishimura, Yoshitsugu Inoue, Kazunori Sugahara, Geometric Modeling3D Ic ArchitectureElectrical EngineeringImage SensorEngineering	1987	47
Self-aligned silicide technology for ultra-thin SIMOX MOSFETs Yasuo Yamaguchi, T. Nishimura, Y. Akasaka, IEEE Transactions on Electron Devices Materials ScienceElectrical EngineeringSalicide TechnologyEngineeringSalicide Process	1992	47
A mobility model including the screening effect in MOS inversion layer Masayoshi Shirahata, H. Kusano, N. Kotani, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems Device ModelingSemiconductorsElectrical EngineeringSemiconductor TechnologyEngineering	1992	40
Orientation control of the silicon film on insulator by laser recrystallization Kengo Sugahara, S. Kusunoki, Y. Inoue, Journal of Applied Physics Optical MaterialsEngineeringCrystal Growth TechnologySilicon On InsulatorPulsed Laser Deposition	1987	38
Raman scattering study of ion implanted and C.W.-Laser annealed polycrystalline silicon Satοru Nakashima, S. Oima, Akiyoshi Mitsuishi, Solid State Communications Materials ScienceIon ImplantationEngineeringOptical PropertiesApplied Physics	1981	36
Concept and basic technologies for 3-D IC structure Y. Akasaka, T. Nishimura EngineeringVlsi DesignComputer ArchitectureComputer-aided DesignNovel Functional Device	1986	35
Raman microprobe study of recrystallization in ion-implanted and laser-annealed polycrystalline silicon Satοru Nakashima, Y. Inoue, Michihiro Miyauchi, Journal of Applied Physics Optical MaterialsEngineeringLaser ApplicationsLaser-annealed Polycrystalline SiliconOptoelectronic Devices	1983	32

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