Richard J. Buss

Reactive sticking coefficients for silane and disilane on polycrystalline silicon

Richard J. Buss, Pauline Ho, W.G. Breiland et al. · Journal of Applied Physics · 1988 · 152 citations

Materials Engineering, Materials Science, Reactive Sticking Coefficients +13

Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data

Pauline Ho, Justine E. Johannes, Richard J. Buss et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 123 citations

Engineering, Vacuum Device, Chemistry +17

Development of a supersonic O(3P<i>J</i>), O(1D2) atomic oxygen nozzle beam source

S. J. Sibener, Richard J. Buss, Cheuk Yiu Ng et al. · Review of Scientific Instruments · 1980 · 122 citations

Engineering, Nuclear Physics, Physics +14

Reactive scattering of O(1D) + H2

Richard J. Buss, Piergiorgio Casavecchia, Tomohiko Hirooka et al. · Chemical Physics Letters · 1981 · 118 citations

Reactive Scattering, Engineering, Physics +6

Photodissociation of formaldehyde in a molecular beam

Pauline Ho, Douglas J. Bamford, Richard J. Buss et al. · The Journal of Chemical Physics · 1982 · 96 citations

Engineering, Synthetic Photochemistry, Radical Product Hco +17