Yoshihiro Todokoro

Ultrathin silicon dioxide layers with a low leakage current density formed by chemical oxidation of Si

Asuha, Takuya Kobayashi, Osamu Maida et al. · Applied Physics Letters · 2002 · 104 citations

Engineering, Materials Engineering, Materials Science +16

Studies on interface states at ultrathin SiO2/Si(100) interfaces by means of x-ray photoelectron spectroscopy under biases and their passivation by cyanide treatment

Hikaru Kobayashi, Akira Asano, Shinya Asada et al. · Journal of Applied Physics · 1998 · 57 citations

Engineering, Materials Engineering, Materials Science +17

Decrease in gap states at ultrathin SiO2/Si interfaces by crown-ether cyanide treatment

Hikaru Kobayashi, Akira Asano, Masao Takahashi et al. · Applied Physics Letters · 2000 · 40 citations

Engineering, Materials Engineering, Materials Science +17

Mechanism of platinum-enhanced oxidation of silicon at low temperatures

Hikaru Kobayashi, T. Yuasa, Kazuhiro Yamanaka et al. · The Journal of Chemical Physics · 1998 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17

Decrease in the leakage current density of Si-based metal–oxide–semiconductor diodes by cyanide treatment

Akira Asano, Asuha, Osamu Maida et al. · Applied Physics Letters · 2002 · 38 citations

Engineering, Materials Engineering, Materials Science +17