W. S. Cheong - Concepedia

Author

W. S. Cheong

Korea Research Institute of Standards and Science

Also Known As

W. Cheong, W. S. Cheong, W.S. Cheong, Woo S Cheong, Woo Seok CHEONG, Woo Seok Cheong, Woo seok Cheong

Publications

295

Citations

H-Index

Concepts

All Affiliations

Korea Research Institute of Standards and Science Seoul National University Korea Advanced Institute of Science and Technology Nanyang Technological University

About

W. S. Cheong is an author at Korea Research Institute of Standards and Science specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	267
2	Applied Physics	8	8	256
3	Chemical Engineering	2	2	81
4	Materials Engineering	2	2	39
5	Electrical Engineering	1	1	11

W. S. Cheong

Publications

267

Citations

H-Index

Page 1

	Year	Citations
Growth of silicon nanowires by chemical vapor deposition: approach by charged cluster model Nong‐Moon Hwang, W. S. Cheong, Duk Yong Yoon, Journal of Crystal Growth Materials ScienceSilicon NanowiresEngineeringCluster ModelNanomaterials	2000	74
Cost-effective fabrication of microlenses on hybrid sol-gel glass with a high-energy beam�sensitive gray-scale mask Xiao Cong Yuan, Nhi Ngo, W. S. Cheong Optics Express Optical MaterialsEngineeringHebs Gray-scale MaskOptical GlassMicro-optical Component	2002	48
Observation of nanometer silicon clusters in the hot-filament CVD process W. S. Cheong, Nong‐Moon Hwang, Duk Yong Yoon Journal of Crystal Growth Materials ScienceEngineeringPhysicsNanomaterialsNanotechnology	1999	39
High sensitive SiO2/TiO2 hybrid sol-gel material for fabrication of 3 dimensional continuous surface relief diffractive optical elements by electron-beam lithography W. S. Cheong, Larry Yuan, V. Koudriachov, Optics Express Materials ScienceChemical EngineeringEngineeringElectron-beam LithographyBeam Lithography	2002	33
Deposition behavior of Si on insulating and conducting substrates in the CVD process: approach by charged cluster model Nong‐Moon Hwang, W. S. Cheong, Duk Yong Yoon Journal of Crystal Growth Materials EngineeringMaterials ScienceEngineeringCluster ModelNanoelectronics	1999	27
Characteristics of NiO–AZO thin films deposited by magnetron co-sputtering in an O2 atmosphere H.W. Park, Joonho Bang, Kwun Nam Hui, Materials Letters Oxide HeterostructuresMagnetismMaterials ScienceThin Film PhysicsO2 Atmosphere	2012	12
Effects of Sn Concentration on Ultrathin ITO Films Deposited Using DC Magnetron Sputtering Saewon Kang, Hyun Jun Lee, Sang Hyun Cho, Journal of Nanoelectronics and Optoelectronics Materials ScienceMaterials EngineeringEngineeringNanoelectronicsNanotechnology	2012	12
Oxide Thin Film Transistor Circuits for Transparent RFID Applications Seung Hyun Cho, Sang‐Woo Kim, W. S. Cheong, IEICE Transactions on Electronics Electrical EngineeringTransparent ElectrodesEngineeringNanoelectronicsOxide Electronics	2010	11
Effect of substrates on morphological evolution of a film in the silicon CVD process: approach by charged cluster model W. S. Cheong, Duk Yong Yoon, Doh-Y. Kim, Journal of Crystal Growth Materials ScienceSilicon Cvd ProcessEngineeringCluster ModelSurface Science	2000	11

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