Publication | Closed Access

Deposition behavior of Si on insulating and conducting substrates in the CVD process: approach by charged cluster model

Materials EngineeringMaterials ScienceEngineeringCluster ModelNanoelectronicsSurface ScienceApplied PhysicsCvd ProcessSemiconductor Device FabricationDeposition BehaviorElectronic PackagingChemical DepositionChemical Vapor DepositionSilicon On InsulatorThin Film ProcessingElectrical Insulation