Juro Mita - Concepedia

Author

Juro Mita

Oki Electric Industry (Japan)

Also Known As

Juro MITA, Juro Mita

Publications

368

Citations

H-Index

Concepts

All Affiliations

Oki Electric Industry (Japan)Waseda University Advanced Research Institute

About

Juro Mita is an author at Oki Electric Industry (Japan) specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	330
2	Applied Physics	10	10	330
3	Electrical Engineering	4	4	160
4	Chemistry	2	2	58
5	Chemical Engineering	1	1	65

Juro Mita

Publications

330

Citations

H-Index

Page 1

	Year	Citations
The dependences of electroluminescent characteristics of ZnS:Mn thin films upon their device parameters Hiroshi Sasakura, Hiroshi Kobayashi, Shosaku Tanaka, Journal of Applied Physics Materials ScienceMn Thin FilmsElectrical EngineeringIi-vi SemiconductorEngineering	1981	101
Crystallization of Sr<sub>0.7</sub>Bi<sub>2.3</sub>Ta<sub>2</sub>O<sub>9+α</sub> Thin Films by Chemical Liquid Deposition Ichiro Koiwa, Takao Kanehara, Juro Mita, Japanese Journal of Applied Physics Materials EngineeringMaterials ScienceChemical EngineeringEngineeringFerroelectric Application	1996	65
Role of Excess Bi in SrBi<sub>2</sub>Ta<sub>2</sub>O<sub>9</sub> Thin Film Prepared Using Chemical Liquid Deposition and Sol-Gel Method Ichiro Koiwa, Yukihisa Okada, Juro Mita, Japanese Journal of Applied Physics Magnetic PropertiesSbt FilmEngineeringThin Film Process TechnologyChemistry	1997	36
High transconductance AlGaN/GaN-HEMT with recessed gate on sapphire substrate Hideyuki Okita, Katsuaki Kaifu, Juro Mita, physica status solidi (a) Wide-bandgap SemiconductorRecessed GateElectrical EngineeringEngineeringRf Semiconductor	2003	23
Effect of Annealing Method to Crystalize on Sr<sub>0.9</sub>Bi<sub>2.3</sub>Ta<sub>2</sub>O<sub>9+α</sub> Thin Film Properties Formed from Alkoxide Solution Ichiro Koiwa, Kouichi Tani, Juro Mita, Japanese Journal of Applied Physics Sbt FilmEngineeringCrystal Growth TechnologySolid-state ChemistrySr 0.9	1998	22
Orientation Control of Sr<sub>0.7</sub>Bi<sub>2.3</sub>Ta<sub>2</sub>O<sub>9+α</sub> Thin Films by Chemical Liquid Deposition Ichiro Koiwa, Takao Kanehara, Juro Mita, Japanese Journal of Applied Physics Thin Film PhysicsEngineeringThin Film Process TechnologyChemical DepositionSemiconductors	1997	21
Preparation of MgO Protective Layer for AC‐Type Plasma Display Panel by Means of Screen‐Printing Ichiro Koiwa, Takao Kanehara, Juro Mita Journal of The Electrochemical Society Materials ScienceAdvanced PackagingElectrical EngineeringMgo Protective LayerLuminous Efficiency	1995	20
ZnS:Mn Thin Film Electroluminescent Devices Having Doubly-Stacked Insulating Layers Juro Mita, Masumi Koizumi, Hiromasa Kanno, Japanese Journal of Applied Physics Materials ScienceSio 2Electrical EngineeringEngineeringNanoelectronics	1987	16
Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering Juro Mita, Masumi Koizumi, Hiromasa Kanno, Japanese Journal of Applied Physics Optical MaterialsEngineeringThin Film Process TechnologySemiconductor NanostructuresSputtered Zns	1987	13
Correlation Between Composition, Microstructure, and Ferroelectric Properties of SrBi2Ta2 O 9 Thin Films Sachiko Ono, Akira Sakakibara, Tomonori Seki, Journal of The Electrochemical Society EngineeringThin Film Process TechnologyChemical DepositionMultiferroicsGrain Boundaries	1997	13

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