Tsukasa Hayashi

Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna

Eiji Takahashi, Yasuaki Nishigami, Atsushi Tomyo et al. · Japanese Journal of Applied Physics · 2007 · 69 citations

Engineering, Integrated Circuits, Thin Film Process Technology +16

Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units

Hiroshige Deguchi, Hitoshi Yoneda, Kenji Kato et al. · Japanese Journal of Applied Physics · 2006 · 49 citations

Plasma Diffusion, Electrical Engineering, Lia Units +10

Study of Deposition Process in Modulated RF Silane Plasma

Hiroya Kirimura, Hiroshi Maeda, Hiroshi Murakami et al. · Japanese Journal of Applied Physics · 1994 · 28 citations

Silane Discharge, Electrical Engineering, Plasma Parameters +14

Enhancing memory efficiency of Si nanocrystal floating gate memories with high-κ gate oxides

Prakaipetch Punchaipetch, Yukiharu Uraoka, Takashi Fuyuki et al. · Applied Physics Letters · 2006 · 28 citations · Full text

Non-volatile Memory, Engineering, Emerging Memory Technology +20

Determination of Band Discontinuity in Amorphous Silicon Heterojunctions

Tsukasa Hayashi, Seiichi Miyazaki, Masataka Hirose · Japanese Journal of Applied Physics · 1988 · 22 citations

Band Discontinuity, Engineering, Physics +13