Seong-Woon Choi

Block copolymer multiple patterning integrated with conventional ArFlithography

Seung Hak Park, Dong Ok Shin, Bong Hoon Kim et al. · Soft Matter · 2009 · 65 citations

Engineering, Electron-beam Lithography, Pattern Transfer +17

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space

Dmitry Vengertsev, Seung-Hune Yang, Seongbo Shim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 22 citations

Geometric Modeling, Engineering, Calibration +15

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyunjong Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Time-sensitive Networking, Engineering, Electron-beam Lithography +16

The analysis of EUV mask defects using a wafer defect inspection system

Kyoungyong Cho, Joo-On Park, Chang-Min Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 15 citations

Electrical Engineering, Wafer Scale Processing, Engineering +14

Manufacturability evaluation of model-based OPC masks

Sung-Hoon Jang, S. Y. Zinn, Won-Tai Ki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 10 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +18