D. J. Meyer

Low-temperature chemical vapor deposition of epitaxial Si and SiGe layers at atmospheric pressure

W.B. de Boer, D. J. Meyer · Applied Physics Letters · 1991 · 86 citations

Kinetics of silicon-germanium deposition by atmospheric-pressure chemical vapor deposition

T. I. Kamins, D. J. Meyer · Applied Physics Letters · 1991 · 57 citations

Materials Engineering, Materials Science, Chemical Engineering +11

Effect of silicon source gas on silicon-germanium chemical vapor deposition kinetics at atmospheric pressure

T. I. Kamins, D. J. Meyer · Applied Physics Letters · 1992 · 22 citations

Engineering, Atmospheric Pressure, Vacuum Device +16

Ellipsometry for rapid characterization of Si1−<i>x</i>Ge<i>x</i> layers

M. Racanelli, C.I. Drowley, N. David Theodore et al. · Applied Physics Letters · 1992 · 21 citations

Materials Science, Semiconductors, Surface Characterization +15

Applications and processing of SiGe and SiGe:C for high-speed HBT devices

D. J. Meyer, Dennis Webb, M. Ward et al. · Materials Science in Semiconductor Processing · 2001 · 15 citations

Electrical Engineering, Engineering, Vlsi Design +9