P. F. Lee

Growth and characterization of Hf–aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 Å

P. F. Lee, Jiyan Dai, Ka‐Ying Wong et al. · Journal of Applied Physics · 2003 · 60 citations · Full text

Engineering, Optoelectronic Devices, Thin Film Process Technology +16

Epitaxial growth of yttrium-stabilized HfO2 high-<i>k</i> gate dielectric thin films on Si

Jiyan Dai, P. F. Lee, K. H. Wong et al. · Journal of Applied Physics · 2003 · 47 citations

Materials Engineering, Materials Science, Electrical Engineering +14

Spontaneous recovery of hydrogen-degraded TiO2 ceramic capacitors

W. P. Chen, Yu Wang, Jiyan Dai et al. · Applied Physics Letters · 2003 · 38 citations · Full text

Materials Science, Tio2-based Ceramic Capacitors, Chemical Engineering +10

Effects of AlOx-cap layer on the luminescence and photoconductivity of ZnO thin films

Ka-Hei Hui, H. C. Ong, P. F. Lee et al. · Applied Physics Letters · 2005 · 28 citations · Full text

Materials Science, Photoelectric Sensor, Optical Materials +15

Two-step interfacial reaction of HfO2 high-k gate dielectric thin films on Si

P. F. Lee, Jiyan Dai, H.L.W. Chan et al. · Ceramics International · 2004 · 19 citations

Materials Science, Engineering, Applied Physics +6