Publication | Closed Access
Two-step interfacial reaction of HfO2 high-k gate dielectric thin films on Si
19
Citations
15
References
2004
Year
Materials ScienceEngineeringApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationThin FilmsSilicon On InsulatorTwo-step Interfacial ReactionSemiconductor Device
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