Interface Structure and Dielectric Properties of SrTiO₃Thin Film Sputter-Deposited onto Si Substrates

S. Matsubara, T. Sakuma, Shintaro Yamamichi, +2

MRS Proceedings

Cancer-associated galactosyltransferase as a new tumor marker for ovarian clear cell carcinoma.

Shiro Nozawa, M Yajima, T. Sakuma, +6

PubMed

Immunocytochemical TechniqueGynecologyPathologyCancer BiologyGynecology Oncology +14

Preparation of SrTiO₃ Thin Films by Ecr and Thermal Mocvd

P-Y. Lesaicherre, Hisateru Yamaguchi, T. Sakuma, +3

MRS Proceedings

Materials ScienceOxide HeterostructuresMaterials EngineeringMaterial AnalysisEngineering +8

A thin film type magnetic/dielectric hybrid transmission-line with a large wavelength shortening

Shinji Ikeda, Toshiro Sato, Akito Ohshiro, +2

IEEE Transactions on Magnetics

MagnetismElectrical EngineeringEngineeringMicrowave TransmissionAntenna +10

Structural Control of Electroless‐Plated Magnetic Recording Media by Underlayers

Hiroshi Matsubara, Magdalena Toda, T. Sakuma, +4

Journal of The Electrochemical Society

Thin Film PhysicsEngineeringPreferred OrientationThin Film Process TechnologyMagnetic Materials +15

Spin correlation functions by generalized spin orbital density functional and multireference approaches

Shusuke Yamanaka, R. Takeda, Takashi Kawakami, +7

International Journal of Quantum Chemistry

EngineeringSpin SystemsMagnetic ResonanceComputational ChemistrySpin Dynamic +16

A Gbit-scale DRAM stacked capacitor technology with ECR MOCVD SrTiO/sub 3/ and RIE patterned RuO/sub 2/TiN storage nodes

Pierre‐Yves Lesaicherre, Shintaro Yamamichi, Hisateru Yamaguchi, +11

Materials ScienceNon-volatile MemoryElectrical EngineeringEngineeringStorage Nodes +12

A stacked capacitor with an MOCVD-(Ba,Sr)TiO/sub 3/ film and a RuO/sub 2//Ru storage node on a TiN-capped plug for 4 Gbit DRAMs and beyond

Hisateru Yamaguchi, T. Iizuka, Hiroyuki Koga, +14

EngineeringHybrid CapacitorNanoelectronicsElectronic PackagingThin Film Processing +15

A new multilayered common-mode filter on Ni-Zn ferrite substrate

T. Sato, Shinji Ikeda, Yasumasa Hara, +2

IEEE Transactions on Magnetics

Materials EngineeringMagnetismElectrical EngineeringEngineeringRf Semiconductor +7

A stacked capacitor with (Ba/sub x/Sr/sub 1-x/)TiO/sub 3/ for 256M DRAM

K. Koyama, T. Sakuma, Shintaro Yamamichi, +5

DielectricsEngineeringComputer ArchitectureStorage CapacitorMulti-channel Memory Architecture +14