F. Schrey - Concepedia

Author

F. Schrey

AT&T (United States)

Also Known As

F F Schrey, F. F. Schrey, F. SCHREY, F. Schrey, F.F Schrey, F.F. Schrey, Frederik Schrey, Schrey, F.F.

Publications

1.2K

Citations

H-Index

Concepts

All Affiliations

AT&T (United States)TU Wien University of Pennsylvania Alcatel Lucent (Germany)

About

F. Schrey is an author at AT&T (United States) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	23	798
2	Applied Physics	17	23	798
3	Chemical Engineering	4	4	84
4	Chemistry	2	2	53
5	Natural Sciences	1	1	12

F. Schrey

Publications

944

Citations

H-Index

Page 1

	Year	Citations
On the inhomogeneity of Schottky barriers R. T. Tung, James P. Sullivan, F. Schrey Materials Science and Engineering B PhysicsHyperbolic Conservation LawSchottky BarriersNonlinear Hyperbolic ProblemMathematical Modelling	1992	103
Ultrafast intraband spectroscopy of electron capture and relaxation in InAs/GaAs quantum dots Thomas Müller, F. Schrey, G. Strasser, Applied Physics Letters Categoryquantum ElectronicsEngineeringElectronic Excited StateElectron CaptureSemiconductor Nanostructures	2003	102
Molecular beam epitaxy growth of CoSi2 at room temperature R. T. Tung, F. Schrey Applied Physics Letters Materials EngineeringMaterials ScienceRoom TemperatureOriginal Substrate SurfaceEngineering	1989	74
Topography of the Si(111) surface during silicon molecular-beam epitaxy R. T. Tung, F. Schrey Physical Review Letters Materials ScienceSemiconductorsRoom TemperatureEngineeringCrystalline Defects	1989	72
Increased uniformity and thermal stability of CoSi2 thin films by Ti capping R. T. Tung, F. Schrey Applied Physics Letters Materials ScienceMaterials EngineeringSemiconductorsMaterial AnalysisTi Layer	1995	59
Growth of epitaxial NiSi2 on Si(111) at room temperature R. T. Tung, F. Schrey Applied Physics Letters Materials ScienceOxide HeterostructuresSemiconductorsRoom TemperatureEngineering	1989	50
Intraband transitions in quantum dot–superlattice heterostructures F. Schrey, L. Rebohle, Thomas Müller, Physical Review B	2005	43
Homoepitaxial growth of CoSi2 and NiSi2 on (100) and (110) surfaces at room temperature R. T. Tung, F. Schrey, S. M. Yalisove Applied Physics Letters EngineeringCrystal Growth TechnologyChemistrySilicon On InsulatorIi-vi Semiconductor	1989	41
A New LPCVD Technique of Producing Borophosphosilicate Glass Films by Injection of Miscible Liquid Precursors R. Lévy, P. K. Gallagher, F. Schrey Journal of The Electrochemical Society EngineeringBorophosphosilicate Glass FilmsGlass-forming LiquidOptical GlassGlass Material	1987	39
Electroluminescence of a quantum dot cascade structure S. Anders, L. Rebohle, F. Schrey, Applied Physics Letters PhotonicsPhotoluminescenceEngineeringPhysicsQuantum Device	2003	36

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